Isolated Plasma Soft Deposition #2

-Plasma Damage Free
-Low Temperature Process
-Large Area Process


Isolated Plasma Soft Deposition #1

-Plasma Damage Free
-Low Temperature Process
-Large Area Process


3probe station & hot chuck

-measurement of IV curve
-temperature sensor


Ion beam & magnetron sputtering system

-Multicomponent thin film synthesis
-Thin film TCO film deposition
-Ion beam treatment


Rapid Thermal Annealing system

-Post-Heat treatment system in a vacuum
-In-situ High Temperature Process
-Formation of the Oxide and Nitride


Furnace

-Annealing in various environments (vacuum, air, oxygen, nitrogen condition)


Clean bench

-Equipment for solution process


Spin coater

-solution process


Strain sensor tester

-Measurement of resistance, voltage and current


Solar Simulator

-Analysis of performance for solar cells


Steel wool tester

-Measurement in hardness of thin films


Hall measurement

-Analysis of electrical properties for semiconductor and TCO
-Sheet resistance, resistivity, mobility, carrier concentration
-Vander pauw method


laser machine

-Erbium Fiber laser : ELM-20
-Wavelengths from 1545 to 1555 nm
-Annealing / Etching / Patterning


Co-sputtering system

-Polymer sputtering
-Polymer based hybrid materials
-Low temperature sputtering
-DC/RF co-sputtering


Four-point probe

-Measurement of surface sheet resistance


Contact angle analyzer

-Measurement in surface energy of thin films
-Analysis in contact angle of films surface


Bar coater

-Simple/ Uniform Thin film coator
-Easy & Fast Process without Vacuum


Vacuum Oven

-Clean Custody of Sample in Vacuum of Atmospheric
-Sample Dry in Vacuum or Atmospheric


UV/Vis spectrometer

-Measurement of Transmittance of Thin Films
-Measurement of Light Absorption Rate
-Measurement of Reflection Rate


Twist Tester system

-Measurement in change of resistance of thin films
-Estimate the stability of mechanical property


Thermal Evaporation system

-Low Cost and Simple
-Less substrate surface damage
-Excellent purity of films


Temperature measurement system

-Temperature measurement system for thin film heaters


Rolling tester system

-Measurement in change of resistance of thin films -Estimate the stability of mechanical property Combinatorial sputtering system
-Multicomponent thin film synthesis
-Thin film transistor and TCO film deposition


Rapid Thermal Annealing system

-Post-Heat treatment system in a vacuum
-In-situ High Temperature Process
-Formation of the Oxide and Nitride


Pencil hardness system

-Mesurement in hardness of thin films


Ozone treatment

-Hydrophilic/ phobic Surface Modification -Easy & Fast Process without Vacuum


Magnetron sputtering system

-Multicomponent thin film synthesis
-Thin film transistor and TCO film deposition


Linear Facing Target Sputtering system

-Plasma Damage Free
-Low Temperature Process
-Large Area Process


Folding tester system

-Measurement in change of resistance of thin films
-Estimate the stability of mechanical property


Combinatorial sputtereing system

-Multicomponent thin film synthesis
- Thin film transistor and TCO film deposition


Bending Test system

-Measurement in change of resistance of thin films
-Estimate the stability of mechanical property
-Inner bending/Outer bending/Stretching


Alpha step

-Seamless integration of conventional contact profilometer and scanning probe microscope (SPM) technology
-Dual mode operation (tip scan and stage scan) optimized for small area 3D mapping as well as long range profiling


ZIVE SP2

-High quality potentiostat/galvanostat/impedance analyzer
-Voltage pulse or current pulse charge/discharge experiment
-Other electrochemical experiments