Isolated Plasma Soft Deposition #2
-Plasma Damage Free
-Low Temperature Process
-Large Area Process
Isolated Plasma Soft Deposition #1
-Plasma Damage Free
-Low Temperature Process
-Large Area Process
3probe station & hot chuck
-measurement of IV curve
-temperature sensor
Ion beam & magnetron sputtering system
-Multicomponent thin film synthesis
-Thin film TCO film deposition
-Ion beam treatment
Rapid Thermal Annealing system
-Post-Heat treatment system in a vacuum
-In-situ High Temperature Process
-Formation of the Oxide and Nitride
Furnace
-Annealing in various environments (vacuum, air, oxygen, nitrogen condition)
Clean bench
-Equipment for solution process
Spin coater
-solution process
Strain sensor tester
-Measurement of resistance, voltage and current
Solar Simulator
-Analysis of performance for solar cells
Steel wool tester
-Measurement in hardness of thin films
Hall measurement
-Analysis of electrical properties for semiconductor and TCO
-Sheet resistance, resistivity, mobility, carrier concentration
-Vander pauw method
laser machine
-Erbium Fiber laser : ELM-20
-Wavelengths from 1545 to 1555 nm
-Annealing / Etching / Patterning
Co-sputtering system
-Polymer sputtering
-Polymer based hybrid materials
-Low temperature sputtering
-DC/RF co-sputtering
four-point probe
-Measurement of surface sheet resistance
contact angle analyzer
-Measurement in surface energy of thin films
-Analysis in contact angle of films surface
bar coator
-Simple/ Uniform Thin film coator
-Easy & Fast Process without Vacuum
Vacuum Oven
-Clean Custody of Sample in Vacuum of Atmospheric
-Sample Dry in Vacuum or Atmospheric
UV/Vis spectrometer
-Measurement of Transmittance of Thin Films
-Measurement of Light Absorption Rate
-Measurement of Reflection Rate
Twist Tester system
-Measurement in change of resistance of thin films
-Estimate the stability of mechanical property
Thermal Evaporation system
-Low Cost and Simple
-Less substrate surface damage
-Excellent purity of films
Temperature measurement system
-Temperature measurement system for thin film heaters
Rolling tester system
-Measurement in change of resistance of thin films -Estimate the stability of mechanical property Combinatorial sputtering system
-Multicomponent thin film synthesis
-Thin film transistor and TCO film deposition
Rapid Thermal Annealing system
-Post-Heat treatment system in a vacuum
-In-situ High Temperature Process
-Formation of the Oxide and Nitride
Pencil hardness system
-Mesurement in hardness of thin films
Ozone treatment
-Hydrophilic/ phobic Surface Modification -Easy & Fast Process without Vacuum
Magnetron sputtering system
-Multicomponent thin film synthesis
-Thin film transistor and TCO film deposition
Linear Facing Target Sputtering system
-Plasma Damage Free
-Low Temperature Process
-Large Area Process
Folding tester system
-Measurement in change of resistance of thin films
-Estimate the stability of mechanical property
Combinatorial sputtereing system
-Multicomponent thin film synthesis
- Thin film transistor and TCO film deposition
Bending Test system
-Measurement in change of resistance of thin films
-Estimate the stability of mechanical property
-Inner bending/Outer bending/Stretching
Alpha step
-Seamless integration of conventional contact profilometer and scanning probe microscope (SPM) technology
-Dual mode operation (tip scan and stage scan) optimized for small area 3D mapping as well as long range profiling